The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 28, 2025

Filed:

Apr. 19, 2022
Applicant:

Nanya Technology Corporation, New Taipei, TW;

Inventors:

Chia-Lin Tsai, Taoyuan, TW;

Hung-Ru Li, New Taipei, TW;

Wun-Ye Ku, Taoyuan, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06V 10/22 (2022.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G06V 10/225 (2022.01); G06T 2207/20076 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30148 (2013.01); G06T 2207/30204 (2013.01);
Abstract

A wafer inspection method is provided. The wafer inspection method includes identifying a plurality of candidate regions on an image of a DUT on a wafer; generating a confidence score for each of the plurality of candidate regions, wherein the confidence score indicates a probability of a candidate region including a probe mark; selecting a first candidate region having the highest confidence score as a selected region; determining whether a second candidate region in the plurality of candidate regions includes the same probe mark as the first candidate region; and eliminating the second candidate region if the second candidate region includes the same probe mark as the first candidate region.


Find Patent Forward Citations

Loading…