The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2025

Filed:

Sep. 23, 2022
Applicant:

Western Digital Technologies, Inc., San Jose, CA (US);

Inventors:

Susumu Okamura, San Jose, CA (US);

James Mac Freitag, Sunnyvale, CA (US);

Yuankai Zheng, Fremont, CA (US);

Brian R. York, San Jose, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10N 50/10 (2023.01); G01R 33/09 (2006.01); G11B 5/39 (2006.01); G11C 11/16 (2006.01); H01F 10/32 (2006.01); H10B 61/00 (2023.01); H10N 50/85 (2023.01);
U.S. Cl.
CPC ...
H10N 50/10 (2023.02); G01R 33/093 (2013.01); G11B 5/3909 (2013.01); G11C 11/161 (2013.01); H01F 10/325 (2013.01); H01F 10/3272 (2013.01); H10B 61/00 (2023.02); H10N 50/85 (2023.02); G11B 2005/3996 (2013.01);
Abstract

The present disclosure generally relates to magnetoresistive (MR) devices. The MR device comprises a synthetic antiferromagnetic (SAF) layer that increases exchange coupling field, and in turn, less magnetic noise of such devices. The MR device comprises a first ferromagnetic (FM1) layer and a second ferromagnetic (FM2) layer, in between which is an SAF spacer of RuAl alloy having a B2 crystalline structure which may grow epitaxial on BCC (110) or FCC (111) textures, meaning that the (110) or (111) plane is parallel to the surface of MR device substrate. Further, amorphous layers may be inserted into the device structure to reset the growth texture of the device to a (001), (110), or (111) texture in order to promote the growth of tunneling barrier layers or antiferromagnetic (AF) pinning layers.


Find Patent Forward Citations

Loading…