The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2025

Filed:

Jan. 10, 2024
Applicant:

Corning Incorporated, Corning, NY (US);

Inventors:

Gabriel Pierce Agnello, Corning, NY (US);

Matthew Wade Fenton, Elmira, NY (US);

Aize Li, Painted Post, NY (US);

Katherine Anne Lindberg, Corning, NY (US);

Ren Liu, Horseheads, NY (US);

Robert Arthur McIntosh, Painted Post, NY (US);

Adam James Ruggles, Corning, NY (US);

Vitor Marino Schneider, Painted Post, NY (US);

Assignee:

Corning Incorporated, Corning, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H10K 59/122 (2023.01); H01L 23/538 (2006.01); H10K 71/00 (2023.01); H10K 71/13 (2023.01); H10K 71/20 (2023.01); H10K 77/10 (2023.01); H10K 102/00 (2023.01);
U.S. Cl.
CPC ...
H10K 77/111 (2023.02); H01L 23/5387 (2013.01); H10K 71/135 (2023.02); H10K 71/231 (2023.02); H10K 71/236 (2023.02); H10K 2102/311 (2023.02);
Abstract

Foldable substrates have a first portion, a second portion, and a central portion positioned therebetween with a first transition region having a first central surface area of the central portion with a first average angle. In aspects, the first average angle is from about 176.10 to about 179.9° or from about 177.0° to about 179.9°. In aspects, a polymer angle is from 178.3° to about 179.9° or from about 179.10 to about 179.9°. Methods comprise disposing an etch mask over the first major surface of the foldable substrate before etching the foldable substrate. In aspects, the etch mask comprises a first polymer layer positioned between a first barrier layer and the first major surface. In aspects, the etch mask comprises a plurality of ink-jet printed shapes. Methods of measuring a contrast ratio comprise impinging a transparent apparatus with a collimated beam.


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