Standard cell design architecture for reduced voltage droop utilizing reduced contacted gate poly pitch and dual height cells

Abstract

A system and method for creating chip layout are described. In various implementations, a standard cell uses unidirectional tracks for power connections and signal routing. A single track of the metal one layer that uses a minimum width of the metal one layer is placed within a pitch of a single metal gate. The single track of the metal one layer provides a power supply reference voltage level or ground reference voltage level. This placement of the single track provides a metal one power post contacted gate pitch (CPP) of 1 CPP. To further reduce voltage droop, a standard cell uses dual height and half the width of a single height cell along with placing power posts with 1 CPP. The placement of the multiple power rails of the dual height cell allows alignment of the power rails with power rails of other standard cells.