The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 21, 2025

Filed:

Jun. 07, 2022
Applicant:

Nuflare Technology, Inc., Yokohama, JP;

Inventor:

Hiromu Inoue, Yokohama, JP;

Assignee:

NuFlare Technology, Inc., Yokohama, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G01N 21/95 (2006.01); G01N 21/956 (2006.01);
U.S. Cl.
CPC ...
G06T 7/001 (2013.01); G01N 21/9501 (2013.01); G01N 21/95607 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01);
Abstract

According to one aspect of the present invention, a pattern inspection apparatus includes a uniform sizing processing circuit configured to resize a line width of a design pattern being a basis of the figure pattern by using a uniform sizing amount which has been set in advance; a reference image generation circuit configured to generate a reference image corresponding to the secondary electron image by performing image development on data of the design pattern whose line width has been resized; and a line-width dependent correction circuit configured to correct a line width of a figure pattern in the secondary electron image by using a correction amount which has been set in advance depending on a line width size.


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