The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2025
Filed:
Apr. 24, 2024
Zhejiang University, Hangzhou, CN;
Haikuo Wang, Hangzhou, CN;
Yao Tang, Hangzhou, CN;
Jiakun Wu, Hangzhou, CN;
Xiaoping Ouyang, Hangzhou, CN;
Zhejiang University, Hangzhou, CN;
Abstract
A method of detecting internal stress distribution of a transparent material based on X-ray diffraction, which includes the following steps. Coordinates of stress detection positions of a transparent material are established. An initial powder of the transparent material and a standard reference material are processed. A placement coordinate position of the standard reference material on the transparent material is calculated. A standard reference material-containing transparent material is synthesized. Internal stress of the standard reference material is detected as the internal stress of the transparent material at the placement coordinate position.