The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 21, 2025
Filed:
Sep. 29, 2020
Applicant:
Kyocera Corporation, Kyoto, JP;
Inventors:
Assignee:
Kyocera Corporation, Kyoto, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/06 (2006.01); C23C 14/08 (2006.01); C23C 14/34 (2006.01); H01J 37/34 (2006.01);
U.S. Cl.
CPC ...
C23C 14/081 (2013.01); C23C 14/0641 (2013.01); C23C 14/3407 (2013.01); H01J 37/3426 (2013.01); H01J 2237/332 (2013.01);
Abstract
A component for a plasma processing apparatus includes a substrate and a film on at least a part of the substrate. The film includes an oxide, a fluoride, an oxyfluoride, or a nitride of a rare earth element. A ratio σof a compressive stress σto occur across a surface of the film to be exposed to plasma and a compressive stress σto occur across the surface in a direction perpendicular to the compressive stress σis 5 or less. A plasma processing apparatus includes the above component.