The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 14, 2025
Filed:
Oct. 21, 2021
Beijing Naura Microelectronics Equipment Co., Ltd., Beijing, CN;
Shiru Wang, Beijing, CN;
Yujie Yang, Beijing, CN;
BEIJING NAURA MICROELECTRONICS EQUIPMENT CO., LTD., Beijing, CN;
Abstract
A process chamber includes a chamber body, a base, and a magnetic conductive device. The base is arranged in the chamber body. The base includes a carrier surface configured to carry a wafer. The magnetic conductive device includes a magnet structure and a magnetic conductive structure made of a soft magnetic material. The magnet structure is arranged around the base and configured to provide a magnetic field above the base. The magnetic conductive structure is arranged under the carrier surface of the base, has a preset distance from the carrier surface of the base, and is configured to guide the distribution of the magnetic field lines of the magnetic field above the base to cause the intensity of the magnetic field to be evenly distributed above the base and the directions of the magnetic field lines to be consistent at different positions of the corresponding carrier surface.