The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 14, 2025

Filed:

Nov. 16, 2020
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Andreas Schmehl, Noerdlingen, DE;

Heiko Siekmann, Aalen, DE;

Assignee:

CARL ZEISS SMT GMBH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/08 (2006.01); C30B 11/14 (2006.01); C30B 29/06 (2006.01); C30B 29/08 (2006.01);
U.S. Cl.
CPC ...
G02B 5/0891 (2013.01); C30B 11/14 (2013.01); C30B 29/06 (2013.01); C30B 29/08 (2013.01); G02B 5/085 (2013.01);
Abstract

A method for producing a substrate () for an optical element () includes: introducing a starting material, preferably a metal or a semimetal, into a container and melting the starting material, producing a material body having a quasi-monocrystalline volume region () by directionally solidifying the molten starting material proceeding from a plurality of monocrystalline seed plates arranged in the region of a base of the container, and producing the substrate by processing the material body to form an optical surface (). An associated reflective optical element (), in particular for reflecting EUV radiation () includes: a substrate having an optical surface on which a reflective coating () is applied. The substrate is typically produced in accordance with the associated method and has a quasi-monocrystalline volume region ().


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