The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2025
Filed:
Aug. 10, 2021
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventor:
Tatsuya Yamaguchi, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/764 (2006.01); C23C 16/44 (2006.01); C23C 16/455 (2006.01); C23C 16/48 (2006.01); H01J 37/32 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/764 (2013.01); C23C 16/4412 (2013.01); C23C 16/45557 (2013.01); C23C 16/482 (2013.01); H01J 37/32522 (2013.01); H01J 37/32834 (2013.01); H01J 2237/3321 (2013.01); H01L 21/022 (2013.01);
Abstract
A method of manufacturing a semiconductor includes adjusting a temperature of a substrate having a recess formed therein and accommodated in a container to a temperature within a range of 200 degrees C. or higher and 280 degrees or lower, and laminating a polyurea film in the recess in the substrate by supplying isocyanate gas and amine gas into the container.
Yamaguchi, Tatsuya. (2025). Method of manufacturing semiconductor device and film forming apparatus (U.S. Patent No. 12191193). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12191193
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile