The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2025

Filed:

May. 08, 2023
Applicant:

Micron Technology, Inc., Boise, ID (US);

Inventor:

Kyuseok Lee, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11C 8/14 (2006.01); G11C 11/408 (2006.01); G11C 11/4097 (2006.01); H01L 29/423 (2006.01); H10B 12/00 (2023.01); G11C 8/08 (2006.01);
U.S. Cl.
CPC ...
G11C 11/4085 (2013.01); G11C 11/4097 (2013.01); H01L 29/423 (2013.01); H10B 12/488 (2023.02); G11C 8/08 (2013.01); G11C 8/14 (2013.01);
Abstract

In some examples, a subword driver block of a memory device includes a first active region and a second active region adjacent to each other. The first active region forms drains/sources of a first and second transistors in a first region; the second active region forms drains/sources of a third and fourth transistors in a second region, where the first and second regions are adjacent to each other. The first, second, third and fourth transistors are coupled to a common non-active potential via a shared contact overlaid over a merged region between the first and second regions. The first and second active regions may comprise N+ diffusion materials.


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