The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 07, 2025

Filed:

Sep. 12, 2022
Applicant:

Nichia Corporation, Anan, JP;

Inventors:

Tomohisa Hasunuma, Kobe, JP;

Yuichi Kato, Kobe, JP;

Yasuo Fujikawa, Yokohama, JP;

Tomohiro Tsurumoto, Yokohama, JP;

Assignee:

NICHIA CORPORATION, Anan, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C12N 1/12 (2006.01); A01G 33/00 (2006.01); C12M 1/00 (2006.01); C12N 13/00 (2006.01);
U.S. Cl.
CPC ...
C12N 1/12 (2013.01); C12M 21/02 (2013.01); C12N 13/00 (2013.01); A01G 33/00 (2013.01);
Abstract

A method of cultivating algal cells of an algae belonging to a class selected from Chlorophyceae, Euglenophyceae, Bacillariophyceae and Haptophyceae includes: irradiating the algal cells with an artificial light having a ratio of (i) photon flux density in a wavelength range of 520-630 nm to (ii) photosynthetic photon flux density, that is 65% or more; and measuring a cell size of the algal cells. Irradiation and non-irradiation of the algal cells with the artificial light are switched, or the photon flux density in the wavelength range of 520-630 nm is changed, according to the measured cell size.


Find Patent Forward Citations

Loading…