The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 07, 2025
Filed:
Jan. 13, 2022
Applicant:
Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;
Inventors:
Assignee:
TOKYO OHKA KOGYO CO., LTD., Kawasaki, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/00 (2006.01); C11D 1/75 (2006.01); C11D 3/04 (2006.01); C11D 3/20 (2006.01); C11D 3/28 (2006.01); C11D 3/30 (2006.01); C11D 3/36 (2006.01); H05K 3/10 (2006.01);
U.S. Cl.
CPC ...
C09K 13/00 (2013.01); C11D 1/75 (2013.01); C11D 3/044 (2013.01); C11D 3/2079 (2013.01); C11D 3/28 (2013.01); C11D 3/30 (2013.01); C11D 3/361 (2013.01); H05K 3/107 (2013.01); C11D 2111/20 (2024.01); Y10T 29/49155 (2015.01);
Abstract
A chemical solution used for cleaning or etching a ruthenium-containing layer, which can obtain the ruthenium-containing layer having a reduced surface roughness while maintaining a good etching rate against the ruthenium, and a method for fabricating ruthenium wiring. The chemical solution includes orthoperiodic acid, a base component, and any one of a nitrogen-containing heterocyclic compound, an organic phosphonic acid, and an organic carboxylic acid.