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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12186715 B1

PDFFull Text
Date of Patent:
Jan. 07, 2025

Filed:

May. 20, 2020

Production method for resist composition purified product, resist pattern forming method, and resist composition purified product

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kanagawa, JP;

Inventors:

Akihiko Nakata, Kawasaki, JP;

Miku Abe, Kawasaki, JP;

Hiroki Saito, Kawasaki, JP;

Assignee:

TOKYO OHKA KOGYO CO., LTD., Kanagawa, JP;

Attorney:

Wenderoth, Lind & Ponack, L.L.P.

Primary Examiner:

Sean M DeGuire

Assistant Examiner:

Andrew Preston Traywick

Int. Cl.
CPC ...
B01D 71/64 (2006.01); B01D 67/00 (2006.01); B01D 69/12 (2006.01); C07C 381/12 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
B01D 71/641 (2022.08); B01D 67/003 (2013.01); B01D 69/12 (2013.01); C07C 381/12 (2013.01); G03F 7/0045 (2013.01); G03F 7/0382 (2013.01); G03F 7/2004 (2013.01); B01D 2325/021 (2013.01);
Abstract

There is provided a production method for a resist composition purified product, which includes a step (i) of filtering a resist composition with a filter having a porous structure in which adjacent spherical cells are connected to each other. The filter includes a porous membrane containing at least one resin selected from the group consisting of polyimide and polyamide imide. The resist composition contains a base material component (A) that exhibits changed solubility in a developing solution under action of acid, an onium salt, and an organic solvent component (S), where the content of the organic solvent component (S) is 97% by mass or more.

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Nakata, Akihiko. (2025). Production method for resist composition purified product, resist pattern forming method, and resist composition purified product (U.S. Patent No. 12186715). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12186715

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