The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2024

Filed:

Oct. 19, 2020
Applicant:

Wuxi Smart Memories Technologies Co., Ltd., Wuxi, CN;

Inventor:

Zhenyu Lu, Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/28 (2006.01); H01L 29/51 (2006.01); H10B 53/10 (2023.01); H10B 53/20 (2023.01); G11C 11/22 (2006.01); H10B 51/10 (2023.01); H10B 51/20 (2023.01);
U.S. Cl.
CPC ...
H10B 53/20 (2023.02); H10B 53/10 (2023.02); G11C 11/221 (2013.01); H01L 29/40111 (2019.08); H01L 29/516 (2013.01); H10B 51/10 (2023.02); H10B 51/20 (2023.02);
Abstract

Embodiments of ferroelectric memory devices and methods for forming the ferroelectric memory devices are disclosed. In an example, a method of forming a ferroelectric memory cell is disclosed. A first electrode is formed. A doped ferroelectric layer is formed in contact with the first electrode. The doped ferroelectric layer includes oxygen and one or more ferroelectric metals. The doped ferroelectric layer further includes a plurality of dopants including at least one dopant from one of Group II elements, Group III elements, or Lanthanide elements. The plurality of dopants are different from the one or more ferroelectric metals. A second electrode is formed in contact with the doped ferroelectric layer.


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