The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2024

Filed:

Jan. 05, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

John Hautala, Beverly, MA (US);

Charith Nanayakkara, Gloucester, MA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 21/7682 (2013.01); H01L 21/02164 (2013.01); H01L 21/02266 (2013.01); H01L 21/02274 (2013.01);
Abstract

A method may include providing an array of patterned features on a substrate, the array of patterned features characterized by a spacing. The method may include directing a sputtering species in a first exposure to the array of patterned features, wherein an upper portion of a patterned feature of the array of patterned features forms a protrusion, extending towards an adjacent patterned feature, of the array of patterned features. The method may also include directing a depositing species in a second exposure to the array of patterned features, wherein an array of voids is formed between adjacent patterned features.


Find Patent Forward Citations

Loading…