The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 31, 2024

Filed:

Apr. 08, 2022
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Shih-Ming Chin, Nantou County, TW;

Hsiao-Chi Huang, Taichung, TW;

Han-Ming Liang, Tainan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); G06K 7/10 (2006.01); G06K 7/14 (2006.01); H01L 21/308 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67294 (2013.01); G06K 7/10138 (2013.01); G06K 7/1447 (2013.01); H01L 21/3083 (2013.01); H01L 21/67253 (2013.01);
Abstract

A system includes a first mask, a second mask and a mask container. The first mask includes a first identification code and a second identification code. The second mask includes a third identification code and a fourth identification code. The mask container is configured to store the first mask and the second mask. The first identification code is different from the third identification code. In response to a pattern, for performing a photolithography process, on the first mask, that is different from a pattern on the second mask, the second identification code is different from the fourth identification code. In response to the pattern on the first mask being the same as the pattern on the second mask, the second identification code is the same as the fourth identification code.


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