The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 10, 2024

Filed:

Dec. 03, 2020
Applicant:

Showa Denko K.k., Tokyo, JP;

Inventors:

Katsumi Mikami, Tokyo, JP;

Yohsuke Fukuchi, Tokyo, JP;

Hiroshi Kobayashi, Tokyo, JP;

Assignee:

Resonac Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25B 1/245 (2021.01); C25B 9/00 (2021.01); C25B 9/09 (2021.01); C25B 15/023 (2021.01); C25B 15/08 (2006.01); G01N 15/02 (2024.01); G01N 15/0205 (2024.01);
U.S. Cl.
CPC ...
C25B 1/245 (2013.01); C25B 9/00 (2013.01); C25B 9/09 (2021.01); C25B 15/023 (2021.01); C25B 15/085 (2021.01); G01N 15/0211 (2013.01); G01N 2015/0277 (2013.01);
Abstract

A device for producing fluorine gas has a first flow path configured to send a fluid from the inside of an electrolytic cell through a mist removal unit configured to remove mist from the fluid to a fluorine gas selection unit and a second flow path configured to send the fluid from the inside of the electrolytic cell to the fluorine gas selection unit without passing through the mist removal unit and has a flow path switching unit configured to switch a flow path through which the fluid flows depending on the average particle size of the mist measured by an average particle size measurement unit. The second flow path has a clogging suppression mechanism configured to suppress clogging of the second flow path by the mist.


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