The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 03, 2024
Filed:
Jun. 08, 2022
Tokyo Electron Limited, Tokyo, JP;
Yuki Kawada, Miyagi, JP;
Naoto Hayasaka, Miyagi, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
There is provided a plasma processing apparatus comprising: a plasma processing chamber having an upper wall, a sidewall, and a lower wall and having therein a plasma processing space; and a magnetic shield disposed around an outer side of the sidewall and having an opening at an upper side thereof. On the assumption that an angle between a line that passes through a midpoint of an inner surface of the upper wall on the plasma processing space side and connects end points of the opening and the inner surface is θ[°] and a product μi×t of an initial relative permeability μi of a magnetic material forming the magnetic shield and a thickness t[m] of the magnetic shield is Pmc[m], the angle θ[°] satisfies a condition θ>764×Pmc+179×Pmc+21.3.