The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 03, 2024

Filed:

Sep. 14, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Yongan Xu, Santa Clara, CA (US);

Chan Juan Xing, San Jose, CA (US);

Jinxin Fu, Fremont, CA (US);

Yifei Wang, Sunnyvale, CA (US);

Ludovic Godet, Sunnyvale, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/33 (2017.01); G06T 7/00 (2017.01);
U.S. Cl.
CPC ...
G06T 7/0006 (2013.01); G06T 7/33 (2017.01); G06T 2207/30148 (2013.01);
Abstract

Embodiments of the present disclosure include a die system and a method of comparing alignment vectors. The die system includes a plurality of dies arranged in a desired pattern. An alignment vector, such as a die vector, can be determined from edge features of the die. The alignment vectors can be compared to other dies or die patterns in the same system. A method of comparing dies and die patterns includes comparing die vectors and/or pattern vectors. The comparison between alignment vectors allows for fixing the die patterns for the next round of processing. The methods provided allow accurate comparisons between as-deposited edge features, such that accurate stitching of dies can be achieved.


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