The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 19, 2024

Filed:

Nov. 29, 2021
Applicant:

Changxin Memory Technologies, Inc., Hefei, CN;

Inventors:

Yin Kuei Yu, Hefei, CN;

Haihan Hung, Hefei, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 49/02 (2006.01); H10B 12/00 (2023.01);
U.S. Cl.
CPC ...
H01L 28/60 (2013.01); H10B 12/033 (2023.02);
Abstract

The present application relates to a capacitor device and a manufacturing method thereof, and a memory. forming a first capacitor structure on a substrate, includes: a first capacitor dielectric layer, a first upper electrode, a plurality of first lower electrodes arranged at intervals; the first capacitor dielectric layer at least covers sidewalls of the first lower electrodes, and the first upper electrode fills up gaps at an outer side of the first capacitor dielectric layer; forming a second capacitor structure on the first capacitor structure, the second capacitor structure includes a second capacitor dielectric layer, a second upper electrode, and a plurality of second lower electrodes arranged at intervals; the second lower electrodes are of a U-shaped structure, bottoms of the second lower electrodes are in contact with tops of the first lower electrodes, the second capacitor dielectric layer is at least located on surfaces of the second lower electrodes.


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