The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 12, 2024

Filed:

Feb. 22, 2021
Applicant:

Shibaura Mechatronics Corporation, Yokohama, JP;

Inventors:

Minami Nakamura, Yokohama, JP;

Daisuke Matsushima, Yokohama, JP;

Kensuke Demura, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 7/00 (2006.01); B08B 3/10 (2006.01); B08B 7/04 (2006.01); G03F 7/00 (2006.01); G03F 7/20 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); G03F 1/82 (2012.01);
U.S. Cl.
CPC ...
B08B 7/0092 (2013.01); B08B 3/10 (2013.01); B08B 7/04 (2013.01); G03F 7/70925 (2013.01); H01L 21/67051 (2013.01); H01L 21/68764 (2013.01); B08B 7/0014 (2013.01); G03F 1/82 (2013.01); H01L 21/67109 (2013.01); H01L 21/67253 (2013.01);
Abstract

According to one embodiment, a substrate treatment device includes a placement stand configured to rotate a substrate, a cooling part configured to supply a cooling gas into a space between the placement stand and the substrate, a liquid supplier configured to supply a liquid on a surface of the substrate opposite to the placement stand side, a detector configured to detect a state of the liquid on the surface of the substrate, and a controller controlling at least one of a rotation speed of the substrate, a flow rate of the cooling gas, or a supply amount of the liquid. The controller sets the liquid on the surface of the substrate to be in a supercooled state, obtains a temperature of the liquid in the supercooled state at a start of freezing, and is configured to calculate a removal ratio of a contamination.


Find Patent Forward Citations

Loading…