The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 05, 2024

Filed:

Jul. 08, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Hsin-Yu Lai, Hsinchu, TW;

Katherine H. Chiang, New Taipei, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01G 4/10 (2006.01); H01G 4/33 (2006.01);
U.S. Cl.
CPC ...
H01G 4/10 (2013.01); H01G 4/33 (2013.01);
Abstract

A capacitor structure, a method for manufacturing a capacitor structure and a method for operating a capacitor structure are provided. The capacitor structure includes a first electrode and a second electrode; a dielectric layer between the first electrode and the second electrode; and an oxygen donor layer between the dielectric layer and the first electrode. An oxygen concentration of the oxygen donor layer increases along a thickness direction from a first surface proximal to the dielectric layer to a second surface proximal to the first electrode.


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