The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 05, 2024
Filed:
May. 05, 2022
Applicant:
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Inventors:
Stephan Zschaeck, Weissendorf, DE;
Uwe Horn, Rudolstadt, DE;
Thomas Kutzner, Cospeda, DE;
Oliver Jaeckel, Jena, DE;
Assignee:
Carl Zeiss SMT GmbH, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 9/02056 (2022.01); G01B 9/02015 (2022.01); G01B 9/02055 (2022.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G01B 9/02059 (2013.01); G01B 9/02015 (2013.01); G01B 9/0207 (2013.01); G03F 7/7085 (2013.01); G03F 7/70883 (2013.01); G03F 7/70933 (2013.01); G01B 2290/60 (2013.01); G01B 2290/70 (2013.01);
Abstract
A device for measuring a substrate for semiconductor lithography with a reference interferometer for ascertaining the change in the ambient conditions, wherein the reference interferometer comprises a means for changing the optical path length of a measurement section of the reference interferometer, and a method for correcting cyclic error components in the reference interferometer using same.