The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 29, 2024
Filed:
Jul. 26, 2022
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Bhaskar Jyoti Bhuyan, San Jose, CA (US);
Mark Saly, Santa Clara, CA (US);
Lakmal C. Kalutarage, San Jose, CA (US);
Thomas Joseph Knisley, Livonia, MI (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01); C23C 16/02 (2006.01); C23C 16/30 (2006.01); C23C 16/455 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0217 (2013.01); C23C 16/0245 (2013.01); C23C 16/308 (2013.01); C23C 16/45525 (2013.01); H01L 21/02118 (2013.01); H01L 21/02211 (2013.01); H01L 21/0228 (2013.01); H01L 21/02315 (2013.01); H01L 21/31138 (2013.01);
Abstract
Methods of enhancing selective deposition are described. In some embodiments, a blocking layer is deposited on a metal surface before deposition of a dielectric. In some embodiments, a metal surface is functionalized to enhance or decrease its reactivity.