The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2024

Filed:

Aug. 30, 2021
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Kei-Wei Chen, Tainan, TW;

Chih Hung Chen, Hsinchu, TW;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); A46B 13/00 (2006.01); B08B 1/12 (2024.01); B08B 1/32 (2024.01); B24B 7/22 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02016 (2013.01); A46B 13/001 (2013.01); B08B 1/12 (2024.01); B08B 1/32 (2024.01); B24B 7/228 (2013.01); H01L 21/02024 (2013.01); H01L 21/02054 (2013.01); A46B 2200/3073 (2013.01); A46B 2200/3093 (2013.01);
Abstract

A method of cleaning and polishing a backside surface of a semiconductor wafer is provided. The method includes placing an abrasive brush, comprising an abrasive tape wound around an outer surface of a brush member of the abrasive brush, on the backside surface of the semiconductor wafer. The method also includes rotating the brush member to polish the backside surface of the semiconductor wafer by abrasive grains formed on the abrasive tape and to clean the backside surface of the semiconductor wafer by the brush member which is not covered by the abrasive tape.


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