The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 29, 2024

Filed:

Jan. 15, 2020
Applicant:

Shenzhen Supro Instruments Limited, Guangdong, CN;

Inventors:

Kai Liang, Shenzhen, CN;

Xiaobo Zhang, Shenzhen, CN;

Zhengkai Chang, Shenzhen, CN;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/255 (2006.01);
U.S. Cl.
CPC ...
G01B 11/255 (2013.01);
Abstract

A device for measuring a curvature radius includes a sample stage configured to support a sample to be measured, a diffracted light array generation module configured to generate and emit a diffracted light array to the sample, and a detection and analysis module configured to receive a reflected light array emitted from the sample and to obtain the curvature radius of the sample according to a dimension of the received reflected light array. Also disclosed is a method for measuring the curvature radius.


Find Patent Forward Citations

Liang, Kai. (2024). Device and method for measuring curvature radius (U.S. Patent No. 12130128). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12130128

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…