The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2024
Filed:
Aug. 24, 2021
Semiconductor Manufacturing South China Corporation, Shanghai, CN;
Semiconductor Manufacturing South China Corporation, Shanghai, CN;
Abstract
A compensation method for overlay deviation, including: obtaining x first inspection distribution maps; and performing a first iteration on wafers of an n-th lot according to the x first inspection distribution maps to obtain an n-th high-order overlay deviation model, that the wafers of the n-th lot include a plurality of n-th wafers, n is a natural number greater than or equal to one, and performing the first iteration includes: obtaining x n-th wafers to be inspected from the wafers of the n-th lot; allocating the x first inspection distribution maps, that each n-th wafer to be inspected corresponds to one first inspection distribution map; obtaining an n-th overlay accuracy information of each n-th wafer to be inspected according to a corresponding first inspection distribution map; and obtaining the n-th high-order overlay deviation model according to the x n-th overlay accuracy information.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile