The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2024

Filed:

Aug. 05, 2020
Applicant:

Asml Holding N.v., Veldhoven, NL;

Inventor:

Alexander Kremer, Stamford, CT (US);

Assignee:

ASML Holding N.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G01J 3/02 (2006.01); G01J 3/44 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70558 (2013.01); G01J 3/021 (2013.01); G01J 3/0291 (2013.01); G01J 3/4406 (2013.01); G03F 7/7085 (2013.01);
Abstract

The present disclosure provides an ultraviolet radiation control system and a related method for control an ultraviolet radiation in a lithographic apparatus. The ultraviolet radiation control system comprises a housing; a conversion crystal (), disposed on or in the housing, configured to convert an ultraviolet radiation to a fluorescent radiation; a plurality of photodetectors () configured to detect an intensity of a scattered portion of the fluorescent radiation; and at least one diffusive surface (), disposed on or in the conversion crystal, configured to increase the intensity of the scattered portion of the fluorescent radiation.


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