The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 22, 2024

Filed:

Jun. 10, 2021
Applicant:

Roche Sequencing Solutions, Inc., Pleasanton, CA (US);

Inventors:

Geoffrey Barrall, San Diego, CA (US);

George John Carman, San Mateo, CA (US);

Takeshi Harada, San Jose, CA (US);

Jason Komadina, Livermore, CA (US);

J. William Maney, Jr., Emerald Hills, CA (US);

Charlotte Yang, San Jose, CA (US);

Assignee:

Roche Sequencing Solutions, Inc., Pleasanton, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G01N 33/487 (2006.01); C12Q 1/6869 (2018.01);
U.S. Cl.
CPC ...
G01N 33/48721 (2013.01); C12Q 1/6869 (2013.01);
Abstract

Systems and methods for inserting a single pore into a membrane are described herein. A stepped or ramped voltage waveform can be applied across the membranes of the cells of an array, where the voltage waveform starts at first voltage and increases in magnitude over a period of time to a second voltage. The first voltage is selected to be low enough to reduce the risk of damaging the membrane, while the rate of voltage increase is selected to provide sufficient time for the pores to insert into the membranes. Once a pore is inserted into the membrane, the voltage across the membrane rapidly drops, thereby reducing the risk of damaging the membrane even if the applied voltage between the electrodes is further increased.


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