The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 15, 2024
Filed:
Oct. 22, 2021
Applicant:
Changxin Memory Technologies, Inc., Hefei, CN;
Inventors:
Assignee:
CHANGXIN MEMORY TECHNOLOGIES, INC., Hefei, CN;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/033 (2006.01); H01L 21/02 (2006.01); H01L 21/311 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0332 (2013.01); H01L 21/02115 (2013.01); H01L 21/0214 (2013.01); H01L 21/02164 (2013.01); H01L 21/31144 (2013.01); H01L 21/76802 (2013.01); H01L 21/76883 (2013.01);
Abstract
A method for manufacturing the mask structure includes: forming a first mask layer, a first buffer layer, a second mask layer, and a second buffer layer sequentially stacked from bottom to top; patterning the second buffer layer and the second mask layer, as to obtain a first pattern structure, the first pattern structure exposes a part of the first buffer layer; forming a first mask pattern on sidewalls of the first pattern structure; forming a carbon plasma layer as a protective layer on an exposed part of an upper surface of the first buffer layer; removing the first pattern structure; and removing a remaining protective layer.