The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 15, 2024

Filed:

Jan. 11, 2022
Applicant:

Carl Zeiss Multisem Gmbh, Oberkochen, DE;

Inventors:

Stefan Schubert, Oberkochen, DE;

Dirk Zeidler, Oberkochen, DE;

Georgo Metalidis, Zang, DE;

Hans Fritz, Grabs, CH;

Ralf Lenke, Lauchheim, DE;

Assignee:

Carl Zeiss MultiSEM GmbH, Oberkochen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/145 (2006.01); H01J 37/10 (2006.01); H01J 37/147 (2006.01); H01J 37/26 (2006.01); H01J 37/302 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3177 (2013.01); H01J 37/10 (2013.01); H01J 37/145 (2013.01); H01J 37/147 (2013.01); H01J 37/263 (2013.01); H01J 37/3023 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/04926 (2013.01);
Abstract

A particle beam system and, such as a multi-beam particle microscope, can have a current intensity of individual particle beams that is flexibly set over large value ranges without structural modifications. The particle beam system can include a condenser lens system, a pre-multi-lens array with a specific pre-counter electrode and a pre-multi-aperture plate, and a multi-lens array. The system can includes a controller to supply adjustable excitations to the condenser lens system and the pre-counter electrode so that the charged particles are incident on the pre-multi-aperture plate in telecentric manner.


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