The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2024
Filed:
Jul. 08, 2021
Changxin Memory Technologies, Inc., Anhui, CN;
Wei Wan, Hefei, CN;
CHANGXIN MEMORY TECHNOLOGIES, INC., Hefei, CN;
Abstract
A semiconductor structure and a method for forming the same are provided. The method includes: providing a semiconductor substrate; determining a position of a bit line contact opening on a top surface of the semiconductor substrate and a top surface of a first dielectric layer; etching an active region, the first dielectric layer and an isolation structure exposed by the bit line contact opening according to the position of the bit line contact opening until the active region is etched to a preset depth to form a bit line contact window; and forming a second dielectric layer on a surface of the isolation structure and a surface of the first dielectric layer that have a depth greater than a depth of a surface of the active region in the bit line contact window.