The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 08, 2024
Filed:
Jun. 28, 2023
Nanotronics Imaging, Inc., Cuyahoga Falls, OH (US);
Matthew C. Putman, Brooklyn, NY (US);
John B. Putman, Celebration, FL (US);
Vadim Pinskiy, Wayne, NJ (US);
Damas Limoge, Brooklyn, NY (US);
Andrew Sundstrom, Brooklyn, NY (US);
James Williams, III, New York, NY (US);
Nanotronics Imaging, Inc., Cuyahoga Falls, OH (US);
Abstract
A system including a deep learning processor receives one or more control signals from one or more of a factory's process, equipment and control (P/E/C) systems during a manufacturing process. The processor generates expected response data and expected behavioral pattern data for the control signals. The processor receives production response data from the one or more of the factory's P/E/C systems and generates production behavioral pattern data for the production response data. The process compares at least one of: the production response data to the expected response data, and the production behavioral pattern data to the expected behavioral pattern data to detect anomalous activity. As a result of detecting anomalous activity, the processor performs one or more operations to provide notice or cause one or more of the factory's P/E/C systems to address the anomalous activity.