The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 2024

Filed:

Nov. 17, 2021
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Kang Luo, Santa Clara, CA (US);

Ludovic Godet, Sunnyvale, CA (US);

Daihua Zhang, Los Altos, CA (US);

Nai-Wen Pi, Santa Clara, CA (US);

Jinrui Guo, San Jose, CA (US);

Rami Hourani, Santa Clara, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B23K 10/00 (2006.01); F21V 8/00 (2006.01);
U.S. Cl.
CPC ...
B23K 10/00 (2013.01); G02B 6/0016 (2013.01); G02B 6/0036 (2013.01);
Abstract

The present disclosure generally relates to a method and apparatus for forming a substrate having a graduated refractive index. A method of forming a waveguide structure includes expelling plasma from an applicator having a head toward a plurality of grating structures formed on a substrate. The plasma is formed in the head at atmospheric pressure. The method further includes changing a depth of the plurality of grating structures with the plasma by removing grating material from the plurality of grating structures.


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