The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2024
Filed:
Nov. 28, 2023
Inpria Corporation, Corvallis, OR (US);
Kai Jiang, Corvallis, OR (US);
Stephen T. Meyers, Corvallis, OR (US);
Lauren B. McQuade, Albany, OR (US);
Jeremy T. Anderson, Corvallis, OR (US);
Brian J. Cardineau, Corvallis, OR (US);
Benjamin L. Clark, Corvallis, OR (US);
Dominick Smiddy, Corvallis, OR (US);
Margaret Wilson-Moses, Corvallis, OR (US);
Inpria Corporation, Corvallis, OR (US);
Abstract
Precursor solutions for radiation patternable coatings are formed with an organic solvent and monoalkyl tin trialkoxides in which the water content of the solvent is adjusted to be within 10 percent of a selected value. Generally, the water content of the solvent is adjusted through water addition, although water removal can also be used. In some embodiments, the adjusted water content of the solvent can be from about 250 ppm by weight to about 10,000 ppm by weight. With the appropriate selection of ligands, the adjusted precursor solutions can be stable for at least about 42 days, and in some cases at least 8 months.