The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 01, 2024
Filed:
Jun. 24, 2022
Applicant:
City University of Hong Kong, Kowloon, HK;
Inventors:
Assignee:
CITY UNIVERSITY OF HONG KONG, Kowloon, HK;
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/10 (2006.01); C30B 25/18 (2006.01); C30B 29/46 (2006.01); B82Y 30/00 (2011.01);
U.S. Cl.
CPC ...
C30B 29/46 (2013.01); C30B 25/105 (2013.01); C30B 25/18 (2013.01); B82Y 30/00 (2013.01);
Abstract
Disclosed herein is a method of producing a substrate having a wrinkle pattern of a single-layer rhenium disulfide (ReS) nanoflakes deposited thereon. The method is characterized by using ammonium rhenium and sulfur powders as the rhenium source and the sulfur source, respectively; and with the addition of molecular sieve to control the release of the rhenium source during the deposition of ReS, in which a single layer of ReSis deposited on a substrate via chemical vapor deposition. The single-layer ReSis then exposed to UV light to induce the formation of a wrinkle pattern.