The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2024
Filed:
Apr. 01, 2022
Asm Ip Holding B.v., Almere, NL;
Eiichiro Shiba, Hachioji, JP;
ASM IP Holding B.V., , NL;
Abstract
Methods of forming patterned structures suitable for a multiple patterning process are disclosed. Exemplary methods include forming a silicon nitride layer overlying the substrate by providing a silicon precursor to the reaction chamber for a silicon precursor pulse period, providing a nitrogen reactant to the reaction chamber, providing a hydrogen reactant to the reaction chamber, and providing a plasma power to form a plasma within the reaction chamber for a plasma pulse period. An etch profile of sacrificial features on the substrate can be controlled by controlling an amount of hydrogen provided to the reaction chamber and/or using other process parameters.