The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 24, 2024
Filed:
Jan. 20, 2021
Asm Ip Holding B.v., Almere, NL;
Eiichiro Shiba, Hachioji, JP;
ASM IP Holding B.V., Almere, NL;
Abstract
A reactor system may comprise a first gas source; a second gas source; and a reaction chamber fluidly coupled to the first and second gas sources, wherein a first gas and a second may be supplied to the reaction chamber from the first and second gas sources, respectively, to achieve stability of a reaction chamber pressure. The reactor system may further comprise an exhaust line fluidly coupled to and downstream from the reaction chamber; a vent line fluidly coupled to the first and/or second gas source, and to the exhaust line, wherein the vent line bypasses the reaction chamber; a pressure monitor coupled to the vent line configured to monitor a vent line pressure within the vent line; and/or a vent line conductance control valve coupled to the vent line and configured to adjust in response to feedback from the pressure monitor.