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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 12098282 B1

PDFFull Text
Date of Patent:
Sep. 24, 2024

Filed:

Jul. 30, 2020

Film-forming composition, silicon-containing film, and resist pattern-forming method

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Tomoaki Seko, Tokyo, JP;

Tomoya Taji, Tokyo, JP;

Nozomi Satou, Tokyo, JP;

Hiromitsu Tanaka, Tokyo, JP;

Tatsuya Sakai, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Element IP, PLC

Primary Examiner:

Daborah Chacko-Davis

Int. Cl.
CPC ...
G03F 7/075 (2006.01); C08G 77/12 (2006.01); C08G 77/18 (2006.01); C08G 77/48 (2006.01); C08L 83/14 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01);
U.S. Cl.
CPC ...
C08L 83/14 (2013.01); C08G 77/12 (2013.01); C08G 77/18 (2013.01); C08G 77/48 (2013.01); G03F 7/0752 (2013.01); G03F 7/0757 (2013.01); G03F 7/11 (2013.01); G03F 7/2004 (2013.01); G03F 7/325 (2013.01); C08L 2203/16 (2013.01);
Abstract

A film-forming composition includes a compound including a Si—H bond and an orthoester. The compound preferably includes a structural unit that is a structural unit represented by formula (1-1), a structural unit represented by formula (1-2), or a combination thereof. In the formula (1-1) and the formula (1-2), Rand Reach represent a hydroxy group, a halogen atom, or a monovalent organic group having 1 to 20 carbon atoms; and Rrepresents a substituted or unsubstituted divalent hydrocarbon group having 1 to 20 carbon atoms that bonds to two Si atoms.

Find Patent Forward Citations

Seko, Tomoaki. (2024). Film-forming composition, silicon-containing film, and resist pattern-forming method (U.S. Patent No. 12098282). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12098282

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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