The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2024
Filed:
Sep. 13, 2019
Hitachi High-tech Corporation, Tokyo, JP;
Makoto Miura, Tokyo, JP;
Kiyohiko Sato, Tokyo, JP;
Yasushi Sonoda, Tokyo, JP;
Satoshi Sakai, Tokyo, JP;
HITACHI HIGH-TECH CORPORATION, Tokyo, JP;
Abstract
A manufacturing process for a three-dimensional structure device having stacked channels in which channels having a shape of a thin line or a sheet are stacked in a direction vertical to a substrate, a work function control metal is separately formed without expanding a space between FETS having different threshold voltages, and including a first step of performing anisotropic etching to open the mask material until the work function control metal film is exposed; a second step of depositing a protective film; a third step of performing anisotropic etching to remove the protective film while remaining the protective film deposited on sidewalls of the mask material opened in the first step; and a fourth step of performing isotropic etching to selectively remove the mask material between the channels relative to the protective film and the work function control metal film are executed.