The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2024
Filed:
Sep. 13, 2021
Applied Materials, Inc., Santa Clara, CA (US);
Leonard M. Tedeschi, San Jose, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Benjamin C E Schwarz, San Jose, CA (US);
Changgong Wang, San Jose, CA (US);
Vahid Firouzdor, Hillsborough, CA (US);
Sumanth Banda, San Jose, CA (US);
Teng-Fang Kou, Kaohsiung, TW;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods of semiconductor processing may include forming a plasma of a carbon-containing material within a processing region of a semiconductor processing chamber. The methods may include depositing a carbon-containing material on a backside of a substrate housed within the processing region of the semiconductor processing chamber. A front side of the substrate may be maintained substantially free of carbon-containing material. The methods may include performing an etch process on the front-side of the substrate. The methods may include removing the carbon-containing material from the backside of the substrate.