The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2024

Filed:

Jan. 28, 2022
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Chia-Chung Chen, Keelung, TW;

Wen-Shen Chou, Zhubei, TW;

Yung-Chow Peng, Hsinchu, TW;

Ya Yun Liu, Jhubei, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); G01K 7/01 (2006.01); H01L 21/02 (2006.01); H01L 29/423 (2006.01); H01L 29/66 (2006.01); H01L 29/735 (2006.01); H01L 29/786 (2006.01); H01L 29/861 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0665 (2013.01); H01L 21/0259 (2013.01); H01L 29/42392 (2013.01); H01L 29/66545 (2013.01); H01L 29/66553 (2013.01); H01L 29/66742 (2013.01); H01L 29/735 (2013.01); H01L 29/78618 (2013.01); H01L 29/78696 (2013.01); H01L 29/861 (2013.01); G01K 7/015 (2013.01);
Abstract

A semiconductor device includes a first semiconductor well. The semiconductor device includes a channel structure disposed above the first semiconductor well and extending along a first lateral direction. The semiconductor device includes a gate structure extending along a second lateral direction and straddling the channel structure. The semiconductor device includes a first epitaxial structure disposed on a first side of the channel structure. The semiconductor device includes a second epitaxial structure disposed on a second side of the channel structure, the first side and second side opposite to each other in the first lateral direction. The first epitaxial structure is electrically coupled to the first semiconductor well with a second semiconductor well in the first semiconductor well, and the second epitaxial structure is electrically isolated from the first semiconductor well with a dielectric layer.


Find Patent Forward Citations

Loading…