The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2024
Filed:
Jul. 21, 2021
Commissariat a L'energie Atomique ET Aux Energies Alternatives, Paris, FR;
Nicolas Posseme, Grenoble, FR;
Stefan Landis, Grenoble, FR;
Abstract
A method for making an individualization zone of a microchip comprising a first level and a second level of electrical tracks, and a level of interconnections comprising vias. The method includes: providing the first level and a dielectric layer, making a hard metal mask on the dielectric layer, etching the dielectric layer through the mask openings by etching based on fluorinated chemistry, preferably oxidizing the hard metal mask by hydrolysis so as to form randomly distributed residues at certain openings, and filling the openings so as to form at least the vias of the level of interconnections, the vias comprising functional vias at the openings without residues and inactive vias at the openings with residues.