The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2024
Filed:
Oct. 20, 2022
Applicant:
Nuflare Technology, Inc., Yokohama, JP;
Inventor:
Hiroshi Matsumoto, Yokohama, JP;
Assignee:
NuFlare Technology, Inc., Yokohama, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); G03F 7/00 (2006.01); H01J 37/141 (2006.01); H01J 37/24 (2006.01); H01J 37/302 (2006.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3177 (2013.01); G03F 7/70016 (2013.01); H01J 37/141 (2013.01); H01J 37/24 (2013.01); H01J 37/3023 (2013.01); H01L 21/0277 (2013.01); H01J 2237/14 (2013.01); H01J 2237/30472 (2013.01); H01J 2237/31754 (2013.01); H01J 2237/31762 (2013.01); H01J 2237/31774 (2013.01);
Abstract
A multi-charged particle beam writing apparatus according to one aspect of the present invention includes a region setting unit configured to set, as an irradiation region for a beam array to be used, the region of the central portion of an irradiation region for all of multiple beams of charged particle beams implemented to be emittable by a multiple beam irradiation mechanism, and a writing mechanism, including the multiple beam irradiation mechanism, configured to write a pattern on a target object with the beam array in the region of the central portion having been set in the multiple beams implemented.