The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 10, 2024

Filed:

Sep. 10, 2021
Applicant:

Ebara Corporation, Tokyo, JP;

Inventor:

Kazuhito Tsuji, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C25D 21/08 (2006.01); C25D 21/10 (2006.01);
U.S. Cl.
CPC ...
C25D 21/08 (2013.01); C25D 21/10 (2013.01);
Abstract

A plating apparatusincludes a rinse moduleconfigured to perform a rinse process. The rinse module includes: a rinse nozzleconfigured to discharge the rinse solution to a member to be rinsedwhile the rinse process is performed; a blow nozzledisposed below the rinse nozzle and blowing out a gas such that the gas crosses a space between the plating tank and a substrate holderwhile the rinse process is performed; and a collection memberdisposed at downstream of the gas blown out from the blow nozzle and collecting the rinse solution dropping from the member to be rinsed and entrained in a flow of the gas blown out from the blow nozzle.


Find Patent Forward Citations

Tsuji, Kazuhito. (2024). Plating apparatus and rinse process method (U.S. Patent No. 12084783). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12084783

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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