The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2024
Filed:
Nov. 11, 2019
Fei Company, Hillsboro, OR (US);
Lubomir Tuma, Brno, CZ;
FEI Company, Hillsboro, OR (US);
Abstract
The invention relates to a method of determining an aberration of a charged particle microscope. The method comprises a step of providing a charged particle microscope that is at least partly operable by a user. Then, a set of image data is obtained with said charged particle microscope. The image data is processed to determine an aberration of said charged particle microscope. According to the invention, said set of image data is actively obtained by a user. In particular, the image data may be obtained during normal operation of the microscope by a user, which may include navigating and/or focusing of the microscope. Thus, the set of image data is acquired by said user, and not by the controller thereof. This allows background processing of an aberration, and aberration correction during use of the charged particle microscope. The invention further relates to a charged particle microscope incorporating the method.