The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2024
Filed:
Feb. 10, 2020
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Mhamed Akhssay, Helmond, NL;
Laurentius Johannes Adrianus Van Bokhoven, Bergeijk, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/706 (2013.01); G03F 7/70504 (2023.05); G03F 7/70891 (2013.01);
Abstract
A method of predicting thermally induced aberrations of a projection system for projecting a radiation beam, the method comprising: calculating a change in temperature of the projection system from a power of the radiation beam output from the projection system using a dynamic linear function; and calculating the thermally induced aberrations from the calculated change in temperature using a static non-linear function.
Quick Actions:
Akhssay, Mhamed. (2024). Method and apparatus for predicting aberrations in a projection system (U.S. Patent No. 12078938). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/12078938
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