The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 03, 2024

Filed:

Sep. 05, 2022
Applicant:

Bruker Technologies Ltd., Migdal HaEmek, IL;

Inventors:

Alexander Krokhmal, Haifa, IL;

Asher Peled, Kfar-Vradim, IL;

Assignee:

BRUKER TECHNOLOGIES LTD., Migdal HaEmek, IL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/223 (2006.01);
U.S. Cl.
CPC ...
G01N 23/223 (2013.01); G01N 2223/076 (2013.01); G01N 2223/3032 (2013.01); G01N 2223/3037 (2013.01); G01N 2223/306 (2013.01); G01N 2223/321 (2013.01); G01N 2223/6116 (2013.01);
Abstract

A system for X-ray analysis, includes: (a) an X-ray analysis assembly configured to (i) direct an X-ray beam to impinge on a surface of a sample, and (ii) receive fluorescence radiation excited from the sample in response to the impinged X-ray beam, (b) a target assembly including measurement targets: placed in an optical path between the X-ray analysis assembly and the sample, and configured to move between (i) one or more first positions in which one or more of the measurement targets are positioned in the X-ray beam, and (ii) one or more second positions in which the optical path is unobstructed by the target assembly, and (c) a processor, configured to control movement of the target assembly between the first and second positions, for alternately, (i) monitoring properties of the X-ray beam using the measurement targets, and (ii) performing the X-ray analysis at a measurement site of the sample.


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