The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 03, 2024
Filed:
Nov. 30, 2020
Industrial Technology Research Institute, Hsinchu, TW;
Kuo-Hsin Lin, Hsinchu, TW;
Li-Duan Tsai, Hsinchu, TW;
Wen-Hsuan Chao, Zhunan Township, TW;
Chiu-Ping Huang, Taoyuan, TW;
Pin-Hsin Yang, Tainan, TW;
Hsiao-Chun Huang, Taoyuan, TW;
Jiunn-Nan Lin, Taoyuan, TW;
Yu-Ming Lin, Tainan, TW;
INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE, Hsinchu, TW;
Abstract
A method for manufacturing nitride catalyst is provided, which includes putting a Ru target and an M target into a nitrogen-containing atmosphere, in which M is Ni, Co, Fe, Mn, Cr, V, Ti, Cu, or Zn. The method also includes providing powers to the Ru target and the M target, respectively. The method also includes providing ions to bombard the Ru target and the M target for depositing MRuNon a substrate by sputtering, wherein 0<x<1.3, 0.7<y<2, and x+y=2, wherein MRuZis cubic crystal system or amorphous.